In wafer manufacturing, batch-type lapping is commonly used for the planarization process. By introducing surface grinding using DFG8360, the load on the lapping process can be minimized while enabling stable, precise thickness control through single-wafer processing.
Furthermore, the use of a fine-mesh grinding wheel reduces the load on subsequent polishing processes, contributing to improved productivity through shorter processing times.
DFG8360 features a high-rigidity, low-vibration spindle that minimizes the impact of heat and vibration on processing accuracy, enabling highly stable continuous processing.
When performing surface grinding with DFG8360, the processing point can be precisely controlled to adjust the wafer shape as desired. As the wafer profile required in downstream processes can be designated on DFG8360, production of high-quality wafers can be achieved.
| Specification | Unit | ||
|---|---|---|---|
| Supported workpiece size | - | Φ300 mm | |
| Grinding method | - | In-feed grinding with wafer rotation | |
| Grinding wheel | - | Φ300 mm diamond wheel | |
| Spindle | Rated output | kW | 7.5 |
| Rated torque | N・m | 17.9 | |
| Rotation speed range | min‐1 | 1,000 - 4,500 | |
| Equipment dimensions(W × D × H) | mm | 1,000 × 3,050 × 2,000 | |
| Equipment weight | kg | Approx. 4,000 | |
*Product appearance, features, specifications, and other details may change due to technical modifications.
*Please read the standard specification sheet thoroughly before use.
| Machine type |
| Spindle |
| C/T |
| Machine dimentions(W × D × H) |
| Machine weight(kg) |
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